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Electronic structure of strained-layer AlAs/InAs (001) superlattices

机译:应变层AlAs / InAs(001)超晶格的电子结构

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摘要

(001) superlattices containing 15 principal layers of AlAs and either one or two of InAs have been grown by atomic-layer molecular-beam epitaxy on undoped (001) GaAs substrates. The samples, between 0.1 and 0.3 m thick, have been studied by photoluminescence, electroreflectance, and piezoreflectance and monitored by phonon Raman-scattering spectroscopy and x-ray diffractometry. An empirical tight-binding model, combined with surface Green-function matching, is used to discuss the experimental data. An overall picture is obtained for the electronic structure of these superlattices with a valence-band offset close to 0.5 eV, which is consistent with the observed spectra. © 1991 The American Physical Society.
机译:(001)包含15个AlAs主层和一个或两个InAs的超晶格已通过原子层分子束外延在未掺杂(001)GaAs衬底上生长。样品厚度在0.1到0.3 m之间,已通过光致发光,电反射和压电反射进行了研究,并通过声子拉曼散射光谱法和X射线衍射仪进行了监测。结合表面格林函数匹配的经验紧密绑定模型来讨论实验数据。获得这些超晶格的电子结构的整体图,其价带偏移接近0.5 eV,这与观察到的光谱一致。 ©1991美国物理学会。

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